Eve Lom Moisture Mask Online Deal

Description

Reveal brighter, hydrated, younger-looking skin with our deeply hydrating Moisture Mask. This intense skin boost is designed to be used twice a week or whenever skin feels thirsty and dehydrated. With an advanced complex of skin quenchers to swiftly restore the skin’s moisture balance and defend against future dryness, dull dehydrated skin is actively replenished and enriched for a more radiant complexion.

FEATURES AND BENEFITS:

• Restores moisture levels in the skin
• Actively replenishes and rehydrates dull skin
• Leaves skin feeling more supple and soft
• Prevents future dehydration and protects from environmental damage
• Increases cellular renewal for a more radiant complexion
• Convenient leave-on format

IngredientsKEY INGREDIENTS:

• Advanced moisture complex (helps restore moisture levels in the skin by improving the skin’s barrier integrity and helps to prevent future skin dehydration).
• Aqua complex (helps increase moisture content in all layers of the epidermis and promotes long-lasting hydration).
• Sodium Hyaluronate (promotes long-lasting hydration).
• Vitamin E (helps protect the skin from environmental damage).

Formulated Without: Parabens, Sulphates, Phthalates, DEA, MEA, Synthetic Fragrance, Synthetic Colourants
Ingredients: AQUA (WATER), GLYCERIN, CYCLOPENTASILOXANE, DIMETHICONE, DIMETHICONE/VINYL DIMETHICONE CROSSPOLYMER, COCONUT ALKANES, GLYCERYL POLYACRYLATE, ACRYLATES COPOLYMER, PROPANEDIOL, PHENOXYETHANOL, POLYGLYCERYL-3 OLEATE, COCO-CAPRYLATE/CAPRATE, SODIUM HYDROXIDE, SODIUM PCA, TOCOPHEROL, UREA, ETHYLHEXYLGLYCERIN, POLYMETHYLSILSESQUIOXANE, SODIUM HYALURONATE, POTASSIUM SORBATE, TREHALOSE, AVENA STRIGOSA SEED EXTRACT, LECITHIN, LEUCONOSTOC/RADISH ROOT FERMENT FILTRATE, POLYQUATERNIUM-51, 1,2-HEXANEDIOL, HYDROXYPROPYL BISPALMITAMIDE MEA, PHYTIC ACID, CITRIC ACID.InstructionsFor best results use twice a week in the evening after cleansing. Apply a generous layer to the face and neck. Leave for a minimum of 15 minutes and then tissue off any excess product. This is a leave-on mask so there is no need to rinse off.